April 22 - 26, 2019
Phoenix, Arizona
2019 MRS Spring Meeting
EP09.08.11
A Study of ZrO2-Based Gate Stack with Incorporation of Yttrium into Interfacial Layer for Germanium MOSFETs
When and Where
Apr 25, 2019
11:45am - 12:00pm
11:45am - 12:00pm
PCC North, 200 Level, Room 224 B
Presenter(s)
Co-Author(s)
Shih-Chieh Chen1,Yi-He Tsai1,Yu-Hong Lu1,Chen-Han Chou1,Chao-Hsin Chien1
National Chiao Tung University1
Keywords
atomic layer deposition | Y | Zr
Symposium Organizers
Rinus Lee, GlobalFoundries
Kah-Wee Ang, National University of Singapore
Catherine Dubourdieu, Helmholtz-Zentrum Berlin / Freie Universität Berlin
John Robertson, Cambridge University
Symposium Support
Applied Materials, Inc.
Session Chairs
Rinus Lee
John Robertson