Plasma-Assisted Atomic Layer Deposition of Ge_xSb_yFilms Using Non-Halide Organo-Metallic Precursors for Phase-Change Electronic Devices

Dec 2, 2019
8:00pm - 10:00pm

Hynes, Level 1, Hall B

Deepa Shukla

Brian Willis

Helena Silva

Saidjafarzoda Ilhom¹,Adnan Mohammad¹,Deepa Shukla¹,Brian Willis¹,Helena Silva¹,Necmi Biyikli¹

University of Connecticut¹

atomic layer deposition | plasma deposition

Laura Schelhas, SLAC-SSRL

Rafael Jaramillo, Massachusetts Institute of Technology

Vladan Stevanovic, Colorado School of Mines

Vanessa Wood, ETH Zurich

Bronze
Semilab USA LLC

Steven Durbin

Rafael Jaramillo

Plasma-Assisted Atomic Layer Deposition of GexSby Films Using Non-Halide Organo-Metallic Precursors for Phase-Change Electronic Devices