December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.35

Plasma-Enhanced Atomic Layer Deposition of Vanadium Dioxide (VO2) Using TEMAV and Oxygen Plasma

When and Where

Dec 3, 2019
8:00pm - 10:00pm
Hynes, Level 1, Hall B

Presenter(s)

Co-Author(s)

Adnan Mohammad1,Saidjafarzoda Ilhom1,Deepa Shukla1,Necmi Biyikli1

University of Connecticut1

Keywords

atomic layer deposition | metal-insulator transition

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Session Chairs

Graziella Malandrino
David Munoz-Rojas

In this Session