December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.35
Plasma-Enhanced Atomic Layer Deposition of Vanadium Dioxide (VO2) Using TEMAV and Oxygen Plasma
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Adnan Mohammad1,Saidjafarzoda Ilhom1,Deepa Shukla1,Necmi Biyikli1
University of Connecticut1
Keywords
atomic layer deposition | metal-insulator transition
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas