December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.02.04

Chemical Vapor Deposition of Cuprous Halide Thin Films

When and Where

Dec 2, 2019
2:30pm - 2:45pm
Hynes, Level 3, Room 310

Presenter(s)

Co-Author(s)

Christina Chang1,Luke Davis1,2,Roy Gordon1

Harvard University1,Tufts University2

Keywords

chemical vapor deposition (CVD) (chemical reaction) | chemical vapor deposition (CVD) (deposition) | surface chemistry

Symposium Organizers

Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Session Chairs

Sean Barry
Ralf Tonner

In this Session