Petru Lunca-Popa¹,Mounib Bahri²,Jacques Botsoa³,Renaud Leturcq¹,Jonathan Crepelliere¹,Jean-Nicolas Audinot¹,Tom Wirtz¹,Didier Arl¹,Ovidiu Ersen²,Marie-France Barthe³,Damien Lenoble¹

Luxembourg Institute of Science and Technology¹,Institut de Physique et Chimie des Matériaux de Strasbourg (IPCMS), UMR CNRS – Université de Strasbourg²,CEMHTI-CNRS, Centre National de la Recherche Scientifique UPR 3079, Orleans³

Keywords

chemical vapor deposition (CVD) (deposition) | oxide

Symposium Organizers

Kevin Musselman, University of Waterloo

Stacey Bent, Stanford University

Karen Gleason, Massachusetts Institute of Technology

David Munoz-Rojas, LMGP Grenoble INP/CNRS

Symposium Support

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

Session Chairs

Kevin Musselman

Greg Randall

2019 MRS Fall Meeting

The Source of the p-Type Doping in the Transparent and Highly Conductive Cu0.66Cr1.33O2 Thin Films Deposited by Dynamic Liquid Injection (DLI)-MOCVD

When and Where

Presenter(s)

Co-Author(s)

Keywords

Symposium Organizers

Symposium Support

Session Chairs

In this Session

The Source of the p-Type Doping in the Transparent and Highly Conductive Cu_0.66Cr_1.33O₂ Thin Films Deposited by Dynamic Liquid Injection (DLI)-MOCVD