December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.04.01
Atomic Level Selective Surface Treatment by Down-Stream Plasma Generated Organic Radicals in Semiconductor Device Fabrication
When and Where
Dec 3, 2019
10:30am - 10:45am
10:30am - 10:45am
Hynes, Level 3, Room 310
Presenter(s)
Co-Author(s)
Hua Chung1,Xinliang Lu1,Haochen Li1,Michael Yang1,Ting Xie1,Qi Zhang1,Shawming Ma1,Il-Kwon Oh2,Stacey Bent2
Mattson Technology Inc1,Stanford University2
Keywords
atomic layer deposition
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
David Munoz-Rojas
Greg Randall