December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.11.06
Atomic Layer Deposition of Metals and Oxides onto Structured Si to Fabricate Efficient Photoanodes
When and Where
Dec 5, 2019
3:30pm - 3:45pm
3:30pm - 3:45pm
Hynes, Level 3, Room 310
Presenter(s)
Co-Author(s)
Lionel Santinacci1,Maxime Dufond1,Maimouna Diouf1,Gabriel Loget2,Chiara Cozzi3,Giuseppe Barillaro3,Jean-Manuel Decams4,Sandra Haschke5,Julien Bachmann5,6
CNRS, Aix-Marseille Univ.1,CNRS, Univ. Rennes 12,University of Pisa3,Annealsys SAS4,University of Erlangen-Nuremberg5,Saint Petersburg State University6
Keywords
atomic layer deposition
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Mato Knez
David Munoz-Rojas