December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF01.17.03
Conformal Wafer-Scale Formation of Patterned van der Waals (W, Mo)Te2 Electrodes with Ideal Schottky Barriers
When and Where
Dec 5, 2019
8:30am - 8:45am
8:30am - 8:45am
Hynes, Level 3, Room 312
Presenter(s)
Co-Author(s)
Seunguk Song1,Yeoseon Sim1,Se-Yang Kim1,Jung Hwa Kim1,Inseon Oh1,Woong Ki Na2,Do Hee Lee1,Jaewon Wang1,Jinsung Kwak1,Hyeonsik Cheong2,Jung-Woo Yoo1,Zonghoon Lee1,Soon-Yong Kwon1
Ulsan National Institute of Science and Technology1,Sogang University2
Keywords
chemical vapor deposition (CVD) (chemical reaction) | electronic structure | lithography (deposition)
Symposium Organizers
Zakaria Al Balushi, University of California, Berkeley
Deep Jariwala, University of Pennsylvania
Olga Kazakova, National Physical Laboratory
Amber McCreary, National Institute of Standards and Technology
Symposium Support
Gold
AIXTRON SE
Silver
2D Crystal Consortium - Materials Innovation Platform (2DCC-MIP)
Bronze
Accurion Inc.
IOP Publishing Ltd - 2D Materials
Scienta Omicron, Inc.
AIXTRON SE
Silver
2D Crystal Consortium - Materials Innovation Platform (2DCC-MIP)
Bronze
Accurion Inc.
IOP Publishing Ltd - 2D Materials
Scienta Omicron, Inc.
Session Chairs
Olga Kazakova
Hyeon Jin Shin