December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.04.04
Area-Selective Deposition Using Atomic-Layer-Deposited Carbon, Fluorine-Free SiOx as an Inhibitor
When and Where
Dec 3, 2019
11:15am - 11:30am
11:15am - 11:30am
Hynes, Level 3, Room 310
Presenter(s)
Co-Author(s)
Taewook Nam1,Inkyu Sohn1,Seunggi Seo1,Tatsuya Nakazawa1,Hyungjun Kim1
Yonsei University1
Keywords
adsorption | atomic layer deposition | thin film
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
David Munoz-Rojas
Greg Randall