Role of the Interlayer in Improving Passivating Contact with Atomic Layer Deposited TiO_x on Crystalline Si

Dec 3, 2019
4:00pm - 4:15pm

Sheraton, 3rd Floor, Fairfax B

Eiji Akiyama

Noritaka Usami¹,Takeya Mochizuki¹,Kazuhiro Gotoh¹,Yasuyoshi Kurokawa¹,Takahisa Yamamoto¹,Tomohiko Hojo²,Eiji Akiyama²

Nagoya University¹,Tohoku University²

atomic layer deposition | oxide

David Young, National Renewable Energy Laboratory

Stefaan De Wolf, King Abdullah University of Science and Technology

Kaining Ding, Research Center Juelich

Takuya Matsui, National Institute of Advanced Industrial Science and Technology

Bronze
Forschungszentrum Jülich GmbH
National Renewable Energy Laboratory
Sinton Instruments

Qijie Guo

Adam Lorenz

Takuya Matsui

Eszter Voroshazi

Role of the Interlayer in Improving Passivating Contact with Atomic Layer Deposited TiOx on Crystalline Si