DFT Study on Atomic Layer Deposition of Cobalt and Ruthenium on NH_x-Terminated Nitrogen Plasma Treated Metal Surfaces

Dec 2, 2019
8:30am - 8:45am

Hynes, Level 3, Room 310

Ji Liu

Ji Liu¹,Michael Nolan¹

Tyndall National Institute¹

atomic layer deposition | surface reaction

Kevin Musselman, University of Waterloo

Stacey Bent, Stanford University

Karen Gleason, Massachusetts Institute of Technology

David Munoz-Rojas, LMGP Grenoble INP/CNRS

Gold
GVD Corporation
Lam Research Corp

Silver
Specialty Coating Systems

Bronze
Waterloo Institute for Nanotechnology

David Bergsman

Graziella Malandrino

DFT Study on Atomic Layer Deposition of Cobalt and Ruthenium on NHx-Terminated Nitrogen Plasma Treated Metal Surfaces