December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.06.02
Microplasma-Driven, Area-Selective Atomic Layer Deposition of Aluminum Oxide at 300K
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
Jinhong Kim1,Andrey Mironov1,Sung-Jin Park1,J Eden1
University of Illinois Urbana Champaign1
Keywords
atomic layer deposition | thin film
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Graziella Malandrino
David Munoz-Rojas