December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
FF05.11.02
Atomic Layer Deposition of Alumina on CVD Silicon Nanostructures—Towards the Development of 3D Ultrastable Aqueous Si Microsupercapacitor
When and Where
Dec 5, 2019
2:00pm - 2:15pm
2:00pm - 2:15pm
Hynes, Level 3, Room 310
Presenter(s)
Co-Author(s)
Pascal Gentile1,Anthony Valero1,Dorian Gaboriau1,Adrien Mery1,Said Sadki2,1
CEA Grenoble1,Université Grenoble Alpes2
Keywords
atomic layer deposition | chemical vapor deposition (CVD) (deposition)
Symposium Organizers
Kevin Musselman, University of Waterloo
Stacey Bent, Stanford University
Karen Gleason, Massachusetts Institute of Technology
David Munoz-Rojas, LMGP Grenoble INP/CNRS
Symposium Support
Gold
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
GVD Corporation
Lam Research Corp
Silver
Specialty Coating Systems
Bronze
Waterloo Institute for Nanotechnology
Session Chairs
Mato Knez
David Munoz-Rojas