chemical vapor deposition (CVD) (deposition)
| In
| oxide
Symposium Organizers
Osamu Ueda, Kanazawa Institute of Technology
Robert Herrick, Intel Corporation
Matteo Meneghini, University of Padova
Kenji Shiojima, University of Fukui
Symposium Support
MRS Invitation to Publish
All authors are invited to submit articles based on their 2018 MRS Spring Meeting presentations to journals in the MRS portfolio. (www.mrs.org/publications-news) Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as symposium collections. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more, including MRS Advances print options available at special rates during the meeting week only.