Spontaneous Etching of Oxide and Sulfide Underlayers by Cu_2-xS Atomic Layer Deposition

When and Where

Apr 3, 2018
5:00pm - 7:00pm

PCC North, 300 Level, Exhibit Hall C-E

Presenter(s)

Raphael Agbenyeke

Bo Keun Park

Gun Hwan Kim

Taek-Mo Chung

Chang Gyoun Kim

Jeong Hwan Han

Co-Author(s)

Raphael Agbenyeke^1,2,Bo Keun Park^1,2,Gun Hwan Kim¹,Taek-Mo Chung^1,2,Chang Gyoun Kim^1,2,Jeong Hwan Han³

Korea Research Institute of Chemical Technology¹,Korea University of Science and Technology²,Seoul National University of Science and Technology³

Keywords

atomic layer deposition | Cu | x-ray photoelectron spectroscopy (XPS)

Symposium Organizers

Adele Tamboli, NREL

Joel Ager, Lawrence Berkeley National Laboratory / University of California, Berkeley

David Scanlon, University College London

Lydia Wong, Nanyang Technological University

Symposium Support

MRS Invitation to Publish
All authors are invited to submit articles based on their 2018 MRS Spring
Meeting presentations to journals in the MRS portfolio.
(www.mrs.org/publications-news) Papers submitted and accepted for
publication in MRS Advances (www.mrs.org/mrs-advances) will be
available as symposium collections. Visit the MRS/Cambridge University
Press Publications Booth #100 in the Exhibit Hall to learn more, including
MRS Advances print options available at special rates during the meeting
week only.

Session Chairs

Joel Ager

Adele Tamboli

2018 MRS Spring Meeting

Spontaneous Etching of Oxide and Sulfide Underlayers by Cu2-xS Atomic Layer Deposition