November 25 - 30, 2017
Boston, Massachusetts
2017 MRS Fall Meeting
TC03.09.03
Simulation Based Investigation of Gas Assisted Focused Ion Beam Etching— Elucidating Resolution Effects
When and Where
Nov 29, 2017
4:15pm - 4:30pm
4:15pm - 4:30pm
Hynes, Level 2, Room 201
Presenter(s)
Co-Author(s)
Philip Rack1,2,Kyle Mahady1,Shida Tan3,Yuval Greenzweig4,Richard Livengood3,Amir Raveh4
University of Tennessee1,Oak Ridge National Laboratory2,Intel Corporation3,Intel Israel4
Keywords
ion-beam processing
Symposium Organizers
Alex Belianinov, Oak Ridge National Laboratory
Frances Allen, University of California, Berkeley
Shinichi Ogawa, National Institute of Advanced Industrial Science and Technology
Tom Wirtz, Luxembourg Institute of Science and Technology (LIST)
Symposium Support
Raith America, Inc.
ZEISS Microscopy
ZEISS Microscopy
MRS Invitation to Publish
All authors are invited to submit articles based on their 2017 MRS Fall Meeting presentations to journals in the MRS portfolio. (www.mrs.org/publications-news) Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as symposium collections. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more, including MRS Advances print options available at special rates during the meeting week only.
Session Chairs
Shinichi Ogawa
Tom Wirtz