chemical vapor deposition (CVD) (chemical reaction)
| thin film
| V
Symposium Organizers
Aline Rougier, Institut de Chimie de la Matière Condensée de Bordeaux
Smagul Karazhanov, Institute for Energy Technology (IFE)
John Reynolds, Georgia Institute of Technology
Kazuki Yoshimura, Advanced Industrial Science and Technology (AIST)
Symposium Support
MRS Invitation to Publish
All authors are invited to submit articles based on their 2017 MRS Fall Meeting presentations to journals in the MRS portfolio. (www.mrs.org/publications-news) Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as symposium collections. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more, including MRS Advances print options available at special rates during the meeting week only.