November 26 - December 1, 2016
Boston, Massachusetts
2016 MRS Fall Meeting
NM2.5.09

Generalized Mechanistic Model for the Chemical Vapor Deposition of 2D Transition Metal Dichalcogenide Monolayers

When and Where

Nov 29, 2016
4:30pm - 4:45pm
Hynes, Level 2, Room 210

Presenter(s)

Co-Author(s)

Ananth Govind Rajan1,Jamie Warner2,Daniel Blankschtein1,Michael Strano1

Massachusetts Institute of Technology1,University of Oxford2

Keywords

chemical vapor deposition (CVD) (deposition) | nucleation & growth

Symposium Organizers

Joshua Robinson, The Pennsylvania State University
Xiangfeng Duan, University of California, Los Angeles
Lain-Jong Li, KAUST
Andrew Wee, National University of Singapore

Symposium Support

All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.

Session Chairs

Francesco Bonaccorso
Mei-Yin Chou

In this Session