chemical vapor deposition (CVD) (chemical reaction)
| electrical properties
Symposium Organizers
Ranjit Pati, Michigan Technological Univ
Don Futaba, AIST
Esko I. Kauppinen, Aalto University School of Science
Ming Zheng, NIST
Symposium Support
The Elizabeth and Richard Henes Center for Quantum Phenomena (Michigan Technological University), Zeon Corporation
All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.