November 26 - December 1, 2016
Boston, Massachusetts
2016 MRS Fall Meeting
NM6.14.05

High Pressure Chemical Vapor Deposition of Semiconductor Electronic Metalattices

When and Where

Dec 1, 2016
11:45am - 12:00pm
Hynes, Level 2, Room 209

Presenter(s)

Co-Author(s)

Hiu Yan Cheng1,Jennifer Russell1,Shih-Ying Yu1,Alex Grede1,David Gidley2,Shaun Mills1,Disha Talreja1,Rongrui He1,Todd Day1,Justin Sparks1,Venkatraman Gopalan1,Ying Liu2,Noel Giebink1,Suzanne Mohney1,Thomas Mallouk1,3,2,Vincent Crespi2,1,John Badding1,2

The Pennsylvania State University1,University of Michigan2,Pennsylvania State University3

Keywords

chemical vapor deposition (CVD) (deposition) | infiltration (assembly) | nanoscale

Symposium Organizers

Georgios A. Sotiriou, ETH Zurich
Einar Kruis, University of Duisburg-Essen
Radenka Maric, Univ of Connecticut
Karsten Wegner, Wegner Consulting

Symposium Support

All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.

Session Chairs

Georgios Sotiriou
Hartmut Wiggers

In this Session