November 26 - December 1, 2016
Boston, Massachusetts
2016 MRS Fall Meeting
PM5.3.17

Effects of Residence Time on Growth Characteristics and Properties of Amorphous Carbon Films Grown by Radical-Injection Plasma-Enhanced Chemical Vapor Deposition

When and Where

Nov 28, 2016
8:00pm - 10:00pm
Hynes, Level 1, Hall B

Presenter(s)

Co-Author(s)

Hirotsugu Sugiura1,Lingyun Jia1,Shunichi Sato1,Hiroki Kondo1,Keigo Takeda1,Kenji Ishikawa1,Makoto Sekine1,Masaru Hori1

Nagoya University1

Keywords

chemical vapor deposition (CVD) (chemical reaction) | chemical vapor deposition (CVD) (deposition)

Symposium Organizers

James Watkins, Univ of Massachusetts
Karen Chong, Institute of Materials Research and Engineering (IMRE) / A-STAR
Jukka Hast, VTT Printed Intelligence
Mark D. Poliks, Binghamton University

Symposium Support

State University of New York at Binghamton, University of Massachusetts Amherst (Center for Hierarchical Manufacturing)
All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.

Session Chairs

Mark D. Poliks
James Watkins

In this Session