November 26 - December 1, 2016
Boston, Massachusetts
2016 MRS Fall Meeting
NM1.19.05

Cooperative Roles of Growth Rate and HCl in the Design of Complex Dopant Patterns and Morphology in Vertical Silicon Nanowire

When and Where

Dec 2, 2016
9:45am - 10:00am
Sheraton, 2nd Floor, Liberty ABC

Presenter(s)

Co-Author(s)

Seokhyoung Kim1,Joseph Christesen1,David Hill1,Christopher Pinion1,James Cahoon1

University of North Carolina at Chapel Hill1

Keywords

chemical vapor deposition (CVD) (chemical reaction) | Si

Symposium Organizers

Chennupati Jagadish, Australian National Univ
James Cahoon, University of North Carolina at Chapel Hill
Hannah Joyce, University of Cambridge
Qihua Xiong, Nanyang Technological Univ

Symposium Support

JC Nabity Lithography Systems, Lake Shore Cryotronics, Inc., MilliporeSigma (Sigma-Aldrich Materials Science), Nano| A Nature Research Solution, SpringerMaterials
All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.

Session Chairs

Sudha Mokkapati

In this Session