Low-Temperature Atomic Layer Deposition of Ultrathin VO_x Interlayer for Efficient Charge Injection in Organic Field-Effect Transistors

When and Where

Nov 29, 2016
4:30pm - 4:45pm

Hynes, Level 3, Room 312

Presenter(s)

Yuanhong Gao

Xinwei Wang

Co-Author(s)

Yuanhong Gao¹,Xinwei Wang¹

School of Advanced Materials, Shenzhen Graduate School, Peking University¹

Keywords

atomic layer deposition | oxide

Symposium Organizers

C. Daniel Frisbie, Univ of Minnesota

Moon Sung Kang, Soongsil University

Karl Leo, Dresden Integrated Center for Applied Physics and Photonic Materials

Takao Someya, The University of Tokyo

Symposium Support

NOVALED GmbH

All journals in the MRS portfolio welcome submissions based on the individual presentations at the 2016 MRS Fall Meeting. Papers submitted and accepted for publication in MRS Advances (www.mrs.org/mrs-advances) will be available as collections of the symposia. Visit the MRS/Cambridge University Press Publications Booth #100 in the Exhibit Hall to learn more about MRS Advances, including print options available at special rates during the meeting week only.

Session Chairs

Michael Chabinyc

2016 MRS Fall Meeting

Low-Temperature Atomic Layer Deposition of Ultrathin VOx Interlayer for Efficient Charge Injection in Organic Field-Effect Transistors