December 1 - 6, 2019
Boston, Massachusetts
2019 MRS Fall Meeting
EL01.10.17
Reactive Ambient Excimer Laser Annealing—Engineering of Low-Loss Transparent Conducting Oxides for IR Plasmonics
When and Where
Dec 3, 2019
8:00pm - 10:00pm
8:00pm - 10:00pm
Hynes, Level 1, Hall B
Presenter(s)
Co-Author(s)
James Hillier1,Demosthenes Koutsogeorgis1,Sophie Camelio2,Panos Patsalas3,Wayne Cranton4,Aleksey Nabok4,Chris Mellor5,Nikolaos Kalfagiannis1
Nottingham Trent University1,Université de Poitiers2,Aristotle University of Thessaloniki3,Sheffield Hallam University4,The University of Nottingham5
Keywords
laser annealing | oxide
Symposium Organizers
Wenshan Cai, Georgia Institute of Technology
Mikko Kataja, CSIC-ICMAB
Ho Wai (Howard) Lee, Baylor Univ
Yu-Jung Lu, Academia Sinica
Symposium Support
Bronze
ACS Photonics | ACS Publications
J. A. Woollam Company, Inc.
Raith America, Inc.
ACS Photonics | ACS Publications
J. A. Woollam Company, Inc.
Raith America, Inc.
Session Chairs
Mikko Kataja