Call for Papers

Please contact the symposium organizers with questions.

Plasmas are unique tools for materials science in terms of both versatility and complexity. Plasma-enhanced processes have been crucial for the growth of the semiconductor industry. Today, plasmas continue to be at the cutting edge of materials research. Their use for atomic layer deposition and etching, for the processing of 2D materials, and for the synthesis of materials for quantum computing underscores their critical role in the microelectronics industry. Their inherent state of thermodynamic non-equilibrium sets them apart from any other materials processing technique, enabling access to materials that would be otherwise unachievable. These novel materials offer immense potential in applications such as photonics, energy storage, and biotechnology, among others. Exciting new opportunities are being explored with respect of driving surface chemistry on plasma-exposed catalysts and initiating electrochemical reactions in liquids.

This symposium will bring together the diverse group of researchers, from both academia and industry, that dedicate their efforts to plasma science and technology at the forefront of materials research. It will provide them with an opportunity to showcase their most recent contributions related to plasma-material interfaces. The complexity of these interfaces creates a vast opportunity for discovery, and the growing prevalence of plasma science in materials fields confirms the importance of this area. This symposium will include topics that relate to diagnostics of the plasma-materials interface, ab-initio atomistic modelling of materials under plasma exposure, use of machine learning to investigate interfacial phenomena, and finally the leveraging of the interface to achieve materials with new functionalities.

Topics will include:

• Plasma for 2D materials synthesis and processing
• Plasma synthesis and processing of nanomaterials and quantum materials
• Modelling of plasma-materials interaction
• Plasma synthesis and processing of materials for energy harvesting and storage
• Plasma catalysis and plasma synthesis of materials for catalysis
• Machine Learning and artificial intelligence for autonomous plasma processes
• Diagnostics and fundamental plasma science at materials interfaces
• Plasma surface and interface engineering
• Plasma synthesis and processing of materials for extreme conditions
• Plasma processes for biosensors and biomaterials

Invited Speakers:

• Peter Bruggeman (University of Minnesota, USA)
• Emily Carter (Princeton University, USA)
• Fabio Di Fonzo (X-nano Srl, Italy)
• Zachary Holman (Arizona State University, USA)
• Brian Jurczyk (Starfire, USA)
• Holger Kersten (Christian-Albrechts-Universität zu Kiel, Germany)
• Erwin Kessels (Technische Universiteit Eindhoven, Netherlands)
• Tae-hee Kim (Wonkwang University, Republic of Korea)
• Taesung Kim (Sungkyunkwan University, Republic of Korea)
• Mark Kushner (University of Michigan, USA)
• Claudia Lopez-Camara (Technische Universiteit Eindhoven, Netherlands)
• Gottlieb Oerhlein (University of Maryland, USA)
• Alok Ranjan (Advanced Materials, USA)
• Mohan Sankaran (University of Illinois at Urbana-Champaign, USA)
• Sedina Tsikata (Georgia Institute of Technology, USA)
• Meng-Jiy Wang (National Taiwan University of Science and Technology, Taiwan)

Symposium Organizers