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Deadline: October 28, 2021, 11:59 pm EDT

Symposium MF01—Cutting-Edge Plasma Processes Contributing to Sustainable Development Goals

Joint symposium with Japan Society of Applied Physics

The Sustainable Development Goals (SDGs) are the blueprint to achieve a better and more sustainable future for all. Recent plasma technologies have been expanded in a wide range of applications from materials processing to environmental issues, medicine and agriculture, and continue to broaden their applicability. Plasma technologies will undoubtedly contribute to our evolving sustainable society. Plasma technology continues to be essential to developing large-capacity, high-speed and highly reliable devices required in the Information Age. Especially, plasma-driven atomic layer deposition and etching are key technologies to realize next-generation three-dimensional nanoelectronics devices. MEMS level large-dimension processing is increasing its importance to realize power devices, sensors and optical communication devices. Plasma-induced reactions have been applied for environmental problems such as soil, gas and water remediation and treatment. Plasma-assisted catalytic process, multiphase plasmas, and plasma-catalyst interaction are a hot topic for fuel and gas-reforming such as fuel reforming, syngas conversion, hydrogen generation, and nitrogen fixation. Plasma processing is a feasible way to realize high-efficiency and low-cost solar cells fabrication. Plasma-plant interaction is applied as plasma agriculture, which ensures a stable food supply. Plasma-bio interactions are paving the way for novel medical treatment such as hemostasis, wound treatment, cancer therapy and virus inactivation.
 
This symposium focuses on the plasma science and technologies that contribute to SDGs, to share the cutting-edge information and accelerate their developments. All of the above-mentioned plasma technologies are based on the advanced plasma-material (solid, liquid, living body, soft-matter, etc,) interactions. Therefore, the fundamental study on plasma sources and plasma-material interaction is also within the scope of the symposium.

Topics will include:

  • Plasma processes for manufacturing functional device; etching and deposition technologies including atomic layer processes, surface reaction and damage
  • Plasma processes for biocompatible materials and biomaterials synthesis
  • Plasma processes for clean and renewable energies; fuel conversion and nitrogen fixation, solar cell fabrication
  • Plasma for environmental issues (e.g. water and gas treatment, recycling)
  • Plasma agriculture; seed germination, plant growth promotion, sterilization, food preservation
  • Plasma processes for biological and medical application, plasma interaction with living systems
  • Fundamentals of plasma source and plasma-material (solid, liquid, multiphase, living body, soft-matter, etc.) interactions
  • Other topics of plasma application contributing to SDGs
  • A tutorial complementing this symposium is tentatively planned.

Invited Speakers (tentative):

  • Peter Bruggeman (University of Minnesota, USA)
  • Masaru Hori (Nagoya University, Japan)
  • Erwin Kessels (Technische Universiteit Eindhoven, Netherlands)
  • Mark J. Kushner (University of Michigan, USA)
  • Catherine Labelle (Intel Corporation, USA)
  • Dae-Hoon Lee (Korea Institute of Machinery & Materials, Republic of Korea)
  • Nathan Marchack (IBM T.J. Watson Research Center, USA)
  • Selma Mededovic (Clarkson University, USA)
  • Tsuyoshi Moriya (Tokyo Electron Ltd., Japan)
  • Tomohiro Nozaki (Tokyo Institute of Technology, Japan)
  • Gyungsoon Park (Kwangwoon University, Republic of Korea)
  • Kanta Sangwijit (University of Phayao, Thailand)
  • Endre Szili (University of South Australia, Australia)
  • Satoshi Uchida (Tokyo Metropolitan University, Japan)
  • Takayuki Watanabe (Kyushu University, Japan)

Symposium Organizers

Fumiyoshi Tochikubo
Tokyo Metropolitan University
Department of Electrical Engineering and Computer Science
Japan

Jane P. Chang
University of California, Los Angeles
Department of Chemical and Biomolecular Engineering
USA

Masaharu Shiratani
Kyushu University
Graduate School of Information Science and Electrical Engineering
Japan

David Staack
Texas A&M University
Department of Mechanical Engineering
USA

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