2018 MRS Fall Meeting Home

Symposium PM03—Hierarchical, Hybrid and Roll-to-Roll Manufacturing for Device Applications

This MRS Symposium, the fifth in a biannual series, reflects the increasing interest in complex high-rate roll-to-roll (R2R) technologies as scalable pathways to fabricate devices with electronic or other advanced functionalities, including transistors, memories, physical and chemical sensors, photovoltaic cells, photo detectors, energy storage devices, displays, lighting, biomimetic surfaces and flexible-hybrid electronic devices. Submissions are encouraged for papers describing advanced concepts comprising additive (printing, coating, ALD, PVD, CVD), transformational (curing, annealing), subtractive (laser, molding, embossing, dry-phase), patterning (nano-imprint, optical and contact lithography), and hybrid manufacturing technologies as well as novel substrate handling and alignment concepts aiming for large-area and/or high-resolution patterning. Contributions on sheet-based or wafer-based manufacturing lines with a high degree of throughput and integration are also welcome.

This Symposium is designed as a truly interdisciplinary forum for materials scientists, electronic and mechanical engineers to share the latest breakthroughs on the topic and to discuss novel process workflows and devices. A special focus is laid on hybrid manufacturing technologies, including in-line reliability assessment and quality control.

The Symposium will consist of invited and contributed oral and poster sessions.

Topics will include:

  • Roll-to-roll (R2R) and hybrid manufacturing concepts.
  • Integrated concepts for web-, sheet- and wafer-based micro- and nanofabrication
  • Novel substrate materials and substrate transport concepts
  • Electronic and advanced functional devices including systems integration
  • In-line characterization, reliability, and quality control
  • Physical and chemical materials properties
  • Biotronics for bio-interlocked sensor networks
  • Conventional and digital printing, coating and other solution processing
  • High-throughput CVD, PVD, ALD
  • Molding, embossing, lithography, laser processing
  • Nanomanufacturing (e.g. nanoimprint lithography)
  • Printed electronic circuits and memories, printed NFC, RF, and antennae applications
  • Sensors, including biomedical implantable electronics for health monitoring
  • Large-area interactive and biomimetic surfaces and user interfaces
  • Organic and inorganic solution-based photovoltaics and photo detectors
  • Displays and lighting, energy storage and supply (batteries, fuel cells)
  • A tutorial complementing this symposium is tentatively planned.

Invited Speakers:

  • Azar Alizadeh (GE Global Research, USA)
  • Ana Claudia Arias (University of California, Berkeley, USA)
  • Thomas Bastuck (Fraunhofer Institute for Production Technology IPT, Germany)
  • Thomas Blaudeck (Fraunhofer ENAS, Chemnitz, Germany)
  • Jeroen van den Brand (TNO/Holst Centre, Netherlands)
  • Ken Carter (University of Massachusetts Amherst, USA)
  • Mary B. Chan-Park (Nanyang Technological University, Singapore)
  • Gyoujin Cho (Sunchon, Republic of Korea)
  • Karen Chong (IMRE / A-STAR, Singapore)
  • Ludvig Edman (Umea University, Sweden)
  • Göran Gustafsson (Acreo AB, Norrköping, Sweden)
  • Jukka Hast (VTT Technical Research Center of Finland, Finland)
  • Paul Heremans (imec, Belgium)
  • Maikel van Hest (NREL, USA)
  • Arved C. Hübler (Chemnitz University of Technology, Germany)
  • Frederik C. Krebs (Risö DTU, Denmark)
  • Myoungwon Lee (LG Electronics, Republic of Korea)
  • Benjamin Leever (Air Force Research Laboratory, USA)
  • Thomas Lippert (Paul-Scherrer-Institute, Switzerland)
  • Christian May (COMEDD-IPMS Fraunhofer, Germany)
  • Dieter Nees (JOANNEUM RESEARCH, USA)
  • Theodor Nielsen (NIL Technologies, Denmark)
  • Henning Sirringhaus (University of Cambridge, United Kingdom)
  • Takao Someya (University of Tokyo, Japan)
  • Barbara Stadlober (JOANNEUM RESEARCH, Austria)
  • Vivek Subramanian (University of California, Berkeley, USA)
  • Shizuo Tokito (Yamagata University, Japan)
  • Massimo Tormen (Thunder NIL, Italy)
  • Janos Veres (PARC, USA)
  • Martin Wolk (3M, USA)

Symposium Organizers

Mark D. Poliks
Binghamton University
SSIE/MSE
USA

Nikos Kehagias
Catalan Institute of Nanoscience and Nanotechnology
Nanoimprint Lithography Platform
Spain
34 937 372 649, nikos.kehagias@icn2.cat

Shelby Nelson
Mosaic Microsystems
USA

James Watkins
University of Massachusetts
Polymer Science and Engineering
USA

Keywords for Abstract Submission

Devices, Hybrid, Manufacturing, Roll-to-roll