Oxide Semiconductors and Dielectrics

Dielectrics and Multifunctional Oxides

Alan Doolittle, Georgia Institute of Technology
Doug Hall,
University of Notre Dame
Karl Hirschman, Rochester Institute of Technology
Anderson Janotti, University of Delaware
David Lederman, 
University of California, Santa Cruz
Patrick Lenahan, 
The Pennsylvania State University
Joseph Ngai, 
The University of Texas at Arlington
Angel Yanguas-Gil, 
Argonne National Laboratory

Gallium Oxide and Other Ultra-Wide Bandgap Oxides

Elaheh Ahmadi, University of Michigan
Ramana Chintalapalle, The University of Texas at El Paso
Shizuo Fujita, Kyoto University
Masataka Higashiwaki, 
National Institute of Information and Communications Technology
Karl Hirschman, Rochester Institute of Technology
Mihee Ji, U.S. Army Research Laboratory
Sriram Krishnamoorthy, University of California, Santa Barbara
Shin Mou, 
Air Force Research Laboratory
Hari Nair, Cornell University
Becky (R.L.) Peterson, University of Michigan
Lisa Porter, 
Carnegie Mellon University
Siddharth Rajan, The Ohio State University
Marko Tadjer, U.S. Naval Research Laboratory
Man Hoi Wong, Hong Kong University of Science and Technology
Huili Grace Xing, Cornell University
Hongping Zhao, The Ohio State University

Oxide Semiconductors—Growth, Doping, Defects, Nanostructures and Devices

Leonard Brillson, The Ohio State University
Steve Durbin,
Western Michigan University
Karl Hirschman, Rochester Institute of Technology
Thomas Jackson, The Pennsylvania State University
Anderson Janotti, 
University of Delaware
Mark Losego, 
Georgia Institute of Technology
Hari Nair, Cornell University
Becky (R.L.) Peterson, University of Michigan
Shayla Sawyer, Rensselaer Polytechnic Institute
Sarah Swisher, University of Minnesota

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